Semiconductor Integrated Device & Process Lab.

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2

Effect of the Oxygen Composition Control of HfOx Films on Threshold and Memory Switching Characteristics for Hybrid Memory Applications / Seungwoo Lee, Seong Hun Kim, Seungyeol Oh, Donghwa Lee, Hyunsang Hwang​ / Advanced Electronic Materials 2101257​ (202201)

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A grease for domain walls motion in HfO2-based ferroelectrics Alireza Kashir, Mehrdad Ghiasabadi Farahani, Ján Lančok, Hyunsang Hwang, Stanislav Kamba​ / Nanotechnology​ 33(15),155703​ (202201)

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